Thermal

The George Washington University (GW) Nanofabrication and Imaging Center (GWNIC) features two e-beam evaporators, one Sputter Pulsed Vapor Deposition and a Rapid Thermal Processor.

CHA Criterion Electron Beam (E-Beam) Evaporator and
Criterion Pulsed Vapor Deposition (PVD)

The Criterion system offers midrange sizing that incorporates both load lock and source isolation options. The Criterion systems feature a hinged, water-cooled front door and a new frame design. The new Criterion chamber design with load lock and water cooled chamber will accommodate many tooling configurations and a variety of deposition sources and combinations of sources. System and recipe control is achieved via a touch screen PC/PLC.

The GWNIC has two E-Beam Evaporators to prevent backlog due to deposition times and runs and one Sputter PVD, all based on the Criterion platform.

 

Rapid Thermal Processor (RTP)

The Rapid Thermal Processor (RTP) features:

  • Ramp rate: 100 degrees C/sec
  • Temperature range: ambient to 1300 deg C max
  • Ramp rate: 1 degC/s to 400 degC/s
  • Cold Wall Chamber technology
  • Vacuum = 10-2 mbar max
  • Thermocouple: ambient to 1000 degrees C
  • Pyrometer control: 150 to 1000 degrees C
  • System chiller
  • Vacuum pump
  • Purge gas line: Argon, Nitrogen, or Oxygen