The George Washington University (GW) Nanofabrication and Imaging Center (GWNIC) features two e-beam evaporators, one Sputter Pulsed Vapor Deposition and a Rapid Thermal Processor.
CHA Criterion Electron Beam (E-Beam) Evaporator and Criterion Pulsed Vapor Deposition (PVD)
The Criterion system offers midrange sizing that incorporates both load lock and source isolation options. The Criterion systems feature a hinged, water-cooled front door and a new frame design. The new Criterion chamber design with load lock and water cooled chamber will accommodate many tooling configurations and a variety of deposition sources and combinations of sources. System and recipe control is achieved via a touch screen PC/PLC.
The GWNIC has two E-Beam Evaporators to prevent backlog due to deposition times and runs and one Sputter PVD, all based on the Criterion platform.