The George Washington University (GW) Nanofabrication and Imaging Center (GWNIC) lithography equipment includes:
Raith PIONEER EBL
The Raith PIONEER combines ultra-high resolution electron beam lithography (EBL) and scanning electron microscopy (SEM). The PIONEER features 30kV column technology and a full rotation and tilt stage.
Applications for this instrument include:
Material and structural analysis
Raith VOYAGER EBL
The Raith VOYAGER is a high performance electron beam lithography (EBL) instrument featuring:
50kV eWrite column technology
50MHz pattern generator
200mm wafer handling capability
High throughput single digit nanolithography
Stitch-free lithography due to fixed-beam-moving-stage (FBMS traxx) and modulated-beam-moving-stage (MBMS periodixx) technologies
Neutronics NXQ4000 Mask Aligner
The Neutronics NXQ4000 Series Semi-Automatic Mask Aligner combines innovative design with precision alignment and exposure features. The automatic sequencing makes the system very easy to learn and use. The versatile platform:
Supports soft/hard pressure contact and vacuum contact printing
Supports printing in manual proximity mode
Processes partial and whole substrates up to 150mm (6)inch diameter
Can be configured with Backside Alignment and UV Nano Imprint Lithography
Laurell Technologies Spin Coaters
The Laurell Spin Coating Systems at GWNIC feature programmable push button recipe management which allows control of spin speed, acceleration, and duration. They feature a PTFE chamber and chuck for easy cleanup and will accommodate up to four-inch wafers.
FEI Helios FIB SEM
TheFEI Helios NanoLabTM 660 DualBeamTMis a fully digital, Extreme High Resolution (XHR) Field Emission Scanning Electron Microscope (FE SEM) equipped with Focused Ion Beam (FIB) technology. It allows for fast characterization of nanometer details and analysis in 2D and 3D, very high quality thin sample preparation and flexible nanoprototyping.
The FIB SEM can be used for nanofabrication as well as 3-D reconstruction of biological structures.