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NANOFABRICATION AND IMAGING CENTER

 

Lithography

The George Washington University (GW) Nanofabrication and Imaging Center (GWNIC) lithography equipment includes:

 

Raith PIONEER EBL

The Raith PIONEER combines ultra-high resolution electron beam lithography (EBL) and scanning electron microscopy (SEM). The PIONEER features 30kV column technology and a full rotation and tilt stage.

Applications for this instrument include:

  • Nanolithography
  • SEM imaging
  • Material and structural analysis
  • Chip scanning
Raith Pioneer EBL

 

Raith VOYAGER EBL

The Raith VOYAGER is a high performance electron beam lithography (EBL) instrument featuring:

  • 50kV eWrite column technology
  • 50MHz pattern generator
  • 200mm wafer handling capability
  • High throughput single digit nanolithography
  • Stitch-free lithography due to fixed-beam-moving-stage (FBMS traxx) and modulated-beam-moving-stage (MBMS periodixx) technologies
Raith VOYAGER EBL
 

Neutronix NXQ4000 Mask Aligner

The Neutronix NXQ4000 Series Semi-Automatic Mask Aligner combines innovative design with precision alignment and exposure features. The automatic sequencing makes the system very easy to learn and use. The versatile platform:

  • Supports soft/hard pressure contact and vacuum contact printing
  • Supports printing in manual proximity mode
  • Processes partial and whole substrates up to 150mm (6)inch diameter
  • Can be configured with Backside Alignment and UV Nano Imprint Lithography

Laurell Technologies Spin Coaters

The Laurell Spin Coating Systems at GWNIC feature programmable push button recipe management which allows control of spin speed, acceleration, and duration. They feature a PTFE chamber and chuck for easy cleanup and will accommodate up to four-inch wafers.

 

FEI Helios FIB SEM

The FEI Helios NanoLabTM 660 DualBeamTM is a fully digital, Extreme High Resolution (XHR) Field Emission Scanning Electron Microscope (FE SEM) equipped with Focused Ion Beam (FIB) technology. It allows for fast characterization of nanometer details and analysis in 2D and 3D, very high quality thin sample preparation and flexible nanoprototyping.

The FIB SEM can be used for nanofabrication as well as 3-D reconstruction of biological structures. 

More information about the FIB SEM is included with the Electron Microscopy Equipment.

FEI Helios FIBSEM